電化學原位紅外測試
1. 幾種原位電化學紅外構造簡介
利用分子振動的特征吸收,紅外光譜可以用于原位檢測固體電極上的吸附態物種,從而:(1) 關鍵中間產物的識別和構型鑒定(2)確定電極表面成鍵狀態(3)優先的反應路徑和選擇性確認(4)探究反應環境的影響,如電解液陰離子,陽離子,pH, 添加劑等(5)電極電解液界面雙電層的探測。適用于水系或非水系電催化反應,如CO2RR, HER, OER, ORR, MOR, EOR, NRR,硝酸根還原,有機電合成等。
1.1 IRAS
IRAS或IRRAS,也稱為外反射模式,或透反射模式,光滑電極(玻碳電極,光滑金屬電極或FTO等基底)或將電催化劑滴涂或電沉積到光滑電極上,壓到紅外窗口上形成一層電解液薄層(1-10微米),紅外光束穿過光學窗口經過電解液薄層,然后在電極表面反射紅外光,最后到達紅外檢測器。 外反射模一般選用CaF2窗片,窗片的形狀一般為厚度2mm左右的圓片,梯形、半球形或半圓柱型的晶體也經常被使用。

圖1 外反射示意圖 圖2 ATR原理示意圖
1.2 衰減全反射原理的理解
衰減全反射基本原理:紅外光經過折射率大的晶體再入射到折射率小的試樣表面上,當入射角大于臨界角時,入射光線就會產生全反射。 事實上紅外光并不是全部被反射回來,而是穿透到試樣表面內一定深度后再返回表面在該過程中,試樣在入射光頻率區域內有選擇吸收,反射光強度發生減弱,產生與透射吸收相類似圖,從而獲得樣品表層化學成份的結構信息。 見圖2 ATR原理示意圖。 紅外光穿透晶體界面的深度與晶體折射率和入射光角度有關,常見晶體的折射率見表2,折射率越大,穿透深度越小。
1.3 內反射ATR-SEIRAS和內反射Otto薄層模式

圖3 內反射ATR-SEIRAS 圖4 內反射Otto薄層模式
內反射ATR-SEIRAS模式,也稱為Kretschmann構造,如上圖所示,ATR晶體(ZnSe, Si, Ge)平面上化學鍍或真空鍍一層島狀金屬膜,在金屬膜上底涂或電沉積催化劑,金屬膜作為導電基底,同時作為表面增強劑,使催化劑表面吸附分子的紅外信號會比沒有金屬膜時的信號增強10-1000倍。 這稱為表面增強紅外效應,即SEIRAS。 不同晶體耐受不同范圍pH,光譜范圍也不同,詳見表2
內反射Otto薄層模式,與外反射構造類似,區別是內反射Otto薄層模式下一般選用ZnSe,Ge,Si,金剛石等衰減全反射晶體,是基于ATR的反射原理,見圖4。
2. 實驗注意事項
2.1 內外反射的選擇依據
電化學池
| 可選晶體 | 傳質情況 | 電場線分布情況 | 電極材料要求 | 可檢測物種 |
ATR內反射Kretschmann(ATR-SEIRAS) | Diamond,Si,Ge, ZnSe | 非薄層構造,傳質阻力小 | 均勻 | 金屬膜+滴涂或電沉積催化劑 | 吸附態 |
ATR內反射Otto薄層模 式 | Diamond,Si,Ge, ZnSe | 薄層構造,傳質阻力大 | 不均勻 | 鏡面光滑或粗糙表面催化劑(如碳紙或泡沫鎳負載型) | 吸附態+溶液相 |
外反射薄層模式(IRRAS) | CaF2 | 薄層構造,傳質阻力大 | 不均勻 | 玻碳電極等鏡面光滑基底電極+滴涂或電沉積催化劑 | 吸附態+溶液相 |
表1 電化學原位紅外光譜電化學池構型對比
2.2 晶體選擇
晶體種類 | 光譜范圍(cm-1) | pH 范圍 | 折射率(折射率越大,穿透深度越小) |
ATR模式晶體 | |||
Diamond | 525-4000 | 1-14 | 2.42 |
ZnSe | 520-4000 | 5-9 | 2.40 |
Si | 1200-4000 | 1-12 | 3.40 |
Ge | 575-4000 | 1-14 | 4.00 |
外反射模式晶體 | |||
CaF2 | 1100-4000 | 5-8 | 1.43 |
表2 不同晶體物理化學特性
2.3 入射角度
在ATR和外反射測量中,入射角的角度和是否選用偏振光作為光源決定了得到的光譜強度; 理論上,大的入射角度(70-80°)會更好一些。 然而,由于光束在界面上沿著入射角度并且一般電極尺寸在1-2cm直徑,當角度在60-80°范圍內改變時,沒有發現明顯的信號增強。 使用60或65°的光路,相同的光路附件可以用于外反射和內反射ATR-SEIRAS。
2.4 正峰和倒峰
紅外光譜譜圖的展示有吸光度和透過率兩種方式,互為向上和向下的關系,便于討論,假定以吸光度縱坐標,對于某個電位下的參考譜圖(通常為一條直線),隨電位變化,如果產生正峰(即向上),認為是某種物種生成,若為倒峰(即向下),表示某種物種消耗了。如果針對特定的反應,當某種物種消耗的倒峰解釋不通,或者某個范圍內的峰一上一下,譜峰出現異常的時候,可能與其他兩個因素有關,(1)入射角度(2)金屬顆粒(SEIRAS基底或納米催化劑顆粒)的體積填充因子(volume fraction of the composite occupied by the metal particle),注意:不是顆粒的尺寸。
2.5 光路的選擇
目前常用的光路有兩種,一種是入射角度(一般為60-70度)固定的光路附件,另一種是入射角度可調節(30-80度)的光路附件。可調角度的光路附件,由于采用了平面鏡和非平面的聚焦鏡組合,增加了鏡片的數量從而增大了光能量的損失,采用一次反射的附件的光路系統,由于沒有多次反射減少了能量的損失,得益于高靈敏度的MCT檢測器,兩種光路均可得到高質量的光譜譜圖。
圖5 60°入射角光路示意圖 圖6 VeeMaxIII光路示意圖
2.6 電化學池的選擇(單腔室和雙腔室,流動和靜止)
電化學池的種類非常多,有單腔室的(即三電極處在同一腔室內)和雙腔室的。Dunwell等人[4]系統研究了電解液純度和對電極的種類,研究結果推薦:(1)對于CO2電還原,推薦采用雙腔室,質子交換膜將對電極和工作電極隔開,以避免對電極產物擴散到工作電極干擾工作電極的反應(2)采用高純度試劑配置電解液,有時候需要純化電解液(3)對電極采用碳棒,不采用Pt絲。因為Pt會溶解,可能擴散到陰極,Pt是良好的析氫催化劑。Malkani等人詳細對比了流動和靜止CO電還原效果,研究表明攪拌的情況下傳質更好。但是需要注意的是,實際操作中有些催化劑在強烈對流的狀態下會從晶體表面脫落,導致實驗無法進展。
ATR-SEIRAS模式,或Kretschmann模式,僅適用于粉末催化劑或在金屬膜上電沉積其他催化劑,對于大塊電極或碳紙等多孔基底的催化劑無法表征,因此外反射或Otto模式的也偶爾有使用到。

圖7 外反射電化學池 圖8 小體積內反射雙腔室電化學池
圖9 雙腔室可攪拌電化學池示意圖 圖10 雙腔室可攪拌電化學池
2.7 表面增強紅外注意事項
(1)光譜增強的強度依賴于金屬的表面形貌,真空蒸鍍和電化學沉積所制備的金屬島狀膜都能得到很好的增強效果;
(2)物理吸附和化學吸附的分子都能得到增強,一般情況下化學吸附的分子的增強強度要比物理吸附的分子強;
(3)與金屬表面直接相連的第一層分子的信號最強,增強效應隨著電極表面距離的增加而衰減,即表面增強是一種短程效應。
SEIRAS基底的制備
許多材料可以用來作為金屬沉積的基底,如Ge,Si,ZnSe,CaF2等。增強因子一般和基底材料的折射率以及基底材料本身的化學性質有關,基底本身的化學特性是影響增強效果的很重要因素,因為它決定沉積膜的表面形貌。在每次沉積前對基底的打磨和清洗是保證實驗重復性的管件因素,有時候基底的表面修飾也影響增強效果。
(1)干法制備納米薄膜
主要有真空蒸鍍和濺射方式。金屬膜的增強效果受形貌,顆粒大小,島狀顆粒密度等因素影響。對于蒸鍍,比較低的沉積速率(0.1-0.5nm/min)有利于較好的增強效果。
(2)濕法制備納米薄膜
化學鍍制備得到的金屬膜比真空鍍的膜島狀納米離子的粒徑要大,化學沉積制備的Au膜與硅基底之間的粘附力要比真空蒸鍍的大得多,而且SEIRAS增強因子更大,這可能是因為基底和金膜之間不存在氧化物,即化學鍍之前硅表面先用NH4F去除了表面氧化物。另外,增強的電場會在氧化層內發生衰減,因此制備好的金屬膜要盡快使用,或者使用前進行電化學清洗。
2.8 電化學測試方法的選擇
原位電化學紅外光譜檢測中常用的電化學方法有LSV/CV,計時電流法,單步電位階躍法,多步驟電位階躍法,方波伏安法等。根據所選擇的電化學方法相應的光譜數據采集有手動采集和自動采集兩種。
3. 部分應用案例
CO2電還原Nature Nanotechnology 2021,16, 1386–1393

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鋅離子電池 Joule 2022, 6, 399–417
鋰離子電池ACS Energy Lett. 2020, 5, 1022?1031
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